Center For Nanoscale Science and Engineering

News

May 22, 2009

The CNSE Nanofab cleanroom has taken delivery of its latest Nanoscale tool, a new JEOL JBX-5500FS Direct Write nanolithography system. The new system will take some work load off of the heavily used Zeiss ebeam system already in the cleanroom and offer far smaller feature size and repeatability over a much larger area. The Jeol system has two selectable writing modes: High-resolution writing mode (5th Lens mode) for nano-lithography and High-speed writing mode (4th Lens mode) for sub-micron lithography and the accelerating voltage is also selectable either 25kV or 50kV. The beam scanning speed is up to 12MHz and it realizes high-speed electron-beam lithography. The stage moving system employs step-and-repeat method and the stage position is controlled by high-precision laser interferometer. This stage can load a wafer substrate up to 4 inches and the system can generate a pattern up to 3 inches in diameter with stitching accuracy of less than 40nm. The beam is capable of producing lines and spaces that are less than 10nm in width. The new tool is currently being installed in the cleanroom by Jeol factory and USA personnel and is expected to be available to users in mid to late June.

Another new tool is arriving soon that will allow cleanroom users the ability to design their photo masks in house on state of the art L-edit software. This leading analog/mixed signal IC design tool for the PC platform enables you to get started with minimal training. Users can drawn and edit quickly, with fewer keystrokes and mouse clicks than other layout tools. Using powerful features such as interactive DRC, object snapping, and alignment, you can work more efficiently to save time and money. Files may be exported to GDS, DXF and CIF file formats for direct compatibility with the major mask making vendors and other universities with mask making capabilities. The new mask design software station will save users valuable design time over basic auto-cad based projects.

October 29, 2008

Over 100 trained users!

The CNSE Nanofabrication Cleanroom is currently open for use 24/7 to trained users. The user base has grown to over 100 trained users and all of the processing tools have been online for over 2 yr. Users are required to reserve time on specific tools via the online reservation system (https://www.engr.ucr.edu/cgi-bin/nano/res/index.cgi) and user lab time is now collected and billed thru the card readers upon entry and exit of the room. Card readers to collect user information on high value tools is on the way soon.

Process Engineers are available during daytime hours to assist with training, process development, equipment or facility issues.

Contact:

Sr. Development Engineer- Dong Yan, ext. 2-6264

Sr. Development Engineer- Dexter Humphrey, ext. 2-6265

Asst. Development Engineer- Terry Traver, ext. 2-3388

Lab user policies and protocols are available online at:

http://www.cnse.ucr.edu/user_policies/

The center’s first three powerful Nanoscale systems (Ebeam Lithography, FIB and AFM) are also fully operational. The Focused Ion Beam is capable of In-Situ TEM foil preparation using the Ascend Extreme Access micromanipulator probe, X-ray Diffraction line scanning and mapping (Oxford EDS), and pattern milling (Nabity NPGS). For a consultation appointment on how the FIB can meet your research needs or for training on the new Dimension 5000 AFM or E-beam Lithography system please contact: Dong Yan
Ext.2-6264 dongyan@engr.ucr.edu

The cleanroom facility has already been instrumental in many research projects involving Graphene based PNP junctions, 3D magnetic storage, In/As quantum dots, Nanotube based gate transistors, Si based cantilever sensors, Photodiodes, Nanowire contacts, Zeolite based fuel cell technology and has recently produced its first complete Si-MosFet device.

For information on how to become a user contact:
Mark Heiden
Ext. 2-2551
mheiden@engr.ucr.edu

March 19, 2007

New Equipment Online

The new Nanofabrication Cleanroom is currently open for use 24/7 to trained users. The user base has grown to 70 trained users and the final two processing tools (CVD 4-tube furnace and Oxford ICP) dry etch systems are currently being started up by the manufacturers. Users are required to reserve time on specific tools via the online reservation system. (https://www.engr.ucr.edu/cgi-bin/nano/res/index.cgi) CNSE would like to welcome the cleanroom staff members:

Sr. Development Engineer- Dong Yan, ext. 2-6264 Sr. Development Engineer- Dexter Humphrey, ext. 2-6265 Asst. Development Engineer- Terry Traver, ext. 2-3388

The staff has been working with outside contractors and tool vendors to complete the hook-up phase, write procedures and process recipes, facility completion, tooling, engineering and maintenance as well as training new users on equipment and lab protocol.

The center.s first three powerful Nanoscale systems (Ebeam Lithography, FIB and AFM) are also fully operational. The Focused Ion Beam is now capable of In-Situ TEM foil preparation using the Ascend Extreme Access micromanipulator probe. For a consultation appointment on how the FIB can meet your research needs, or for training on the new Dimension 5000 AFM or E-beam Lithography system please contact:

Dong Yan
Ext. 2-6264
dongyan@engr.ucr.edu

For all other inquiries, contact:
Mark Heiden
Ext. 2-2551
mheiden@engr.ucr.edu

For information on how to become a user of the CNSE Nanofab Cleanroom, go to the User Policies tab.
http://www.cnse.ucr.edu/user_policies/

March 13, 2006
Tool Hookup

June 7, 2005
Construction Images updated!

January 14, 2005
Construction Images available!

September 3, 2004
Construction Has Begun On the Bourns Hall Nanofabrication Cleanroom!


Director's Message Research People Education Tool Set News Lab Capabilities User Policies Employment Cleanroom User Resources
News May 22, 2009 The CNSE Nanofab cleanroom has taken delivery of its latest Nanoscale tool, a new JEOL JBX-5500FS Direct Write nanolithography system. The new system will take some work load off of the heavily used Zeiss ebeam system already in the cleanroom and offer far smaller feature size and repeatability over a much larger area. The Jeol system has two selectable writing modes: High-resolution writing mode (5th Lens mode) for nano-lithography and High-speed writing mode (4th Lens mode) for sub-micron lithography and the accelerating voltage is also selectable either 25kV or 50kV. The beam scanning speed is up to 12MHz and it realizes high-speed electron-beam lithography. The stage moving system employs step-and-repeat method and the stage position is controlled by high-precision laser interferometer. This stage can load a wafer substrate up to 4 inches and the system can generate a pattern up to 3 inches in diameter with stitching accuracy of less than 40nm. The beam is capable of producing lines and spaces that are less than 10nm in width. The new tool is currently being installed in the cleanroom by Jeol factory and USA personnel and is expected to be available to users in mid to late June. Another new tool is arriving soon that will allow cleanroom users the ability to design their photo masks in house on state of the art L-edit software. This leading analog/mixed signal IC design tool for the PC platform enables you to get started with minimal training. Users can drawn and edit quickly, with fewer keystrokes and mouse clicks than other layout tools. Using powerful features such as interactive DRC, object snapping, and alignment, you can work more efficiently to save time and money. Files may be exported to GDS, DXF and CIF file formats for direct compatibility with the major mask making vendors and other universities with mask making capabilities. The new mask design software station will save users valuable design time over basic auto-cad based projects. October 29, 2008 Over 100 trained users! The CNSE Nanofabrication Cleanroom is currently open for use 24/7 to trained users. The user base has grown to over 100 trained users and all of the processing tools have been online for over 2 yr. Users are required to reserve time on specific tools via the online reservation system (https://www.engr.ucr.edu/cgi-bin/nano/res/index.cgi) and user lab time is now collected and billed thru the card readers upon entry and exit of the room. Card readers to collect user information on high value tools is on the way soon. Process Engineers are available during daytime hours to assist with training, process development, equipment or facility issues. Contact: Sr. Development Engineer- Dong Yan, ext. 2-6264 Sr. Development Engineer- Dexter Humphrey, ext. 2-6265 Asst. Development Engineer- Terry Traver, ext. 2-3388 Lab user policies and protocols are available online at: http://www.cnse.ucr.edu/user_policies/ The center’s first three powerful Nanoscale systems (Ebeam Lithography, FIB and AFM) are also fully operational. The Focused Ion Beam is capable of In-Situ TEM foil preparation using the Ascend Extreme Access micromanipulator probe, X-ray Diffraction line scanning and mapping (Oxford EDS), and pattern milling (Nabity NPGS). For a consultation appointment on how the FIB can meet your research needs or for training on the new Dimension 5000 AFM or E-beam Lithography system please contact: Dong Yan Ext.2-6264 dongyan@engr.ucr.edu The cleanroom facility has already been instrumental in many research projects involving Graphene based PNP junctions, 3D magnetic storage, In/As quantum dots, Nanotube based gate transistors, Si based cantilever sensors, Photodiodes, Nanowire contacts, Zeolite based fuel cell technology and has recently produced its first complete Si-MosFet device. For information on how to become a user contact: Mark Heiden Ext. 2-2551 mheiden@engr.ucr.edu March 19, 2007 New Equipment Online The new Nanofabrication Cleanroom is currently open for use 24/7 to trained users. The user base has grown to 70 trained users and the final two processing tools (CVD 4-tube furnace and Oxford ICP) dry etch systems are currently being started up by the manufacturers. Users are required to reserve time on specific tools via the online reservation system. (https://www.engr.ucr.edu/cgi-bin/nano/res/index.cgi) CNSE would like to welcome the cleanroom staff members: Sr. Development Engineer- Dong Yan, ext. 2-6264 Sr. Development Engineer- Dexter Humphrey, ext. 2-6265 Asst. Development Engineer- Terry Traver, ext. 2-3388 The staff has been working with outside contractors and tool vendors to complete the hook-up phase, write procedures and process recipes, facility completion, tooling, engineering and maintenance as well as training new users on equipment and lab protocol. The center.s first three powerful Nanoscale systems (Ebeam Lithography, FIB and AFM) are also fully operational. The Focused Ion Beam is now capable of In-Situ TEM foil preparation using the Ascend Extreme Access micromanipulator probe. For a consultation appointment on how the FIB can meet your research needs, or for training on the new Dimension 5000 AFM or E-beam Lithography system please contact: Dong Yan Ext. 2-6264 dongyan@engr.ucr.edu For all other inquiries, contact: Mark Heiden Ext. 2-2551 mheiden@engr.ucr.edu For information on how to become a user of the CNSE Nanofab Cleanroom, go to the User Policies tab. http://www.cnse.ucr.edu/user_policies/ March 13, 2006 Tool Hookup June 7, 2005 Construction Images updated! January 14, 2005 Construction Images available! September 3, 2004 Construction Has Begun On the Bourns Hall Nanofabrication Cleanroom!
webmaster@engr.ucr.edu