The Rapid Thermal Anneal system (tool #52) is manufactured by Modular Process Technology Corp. The RTP-600S is a rapid thermal processing system, which uses high-intensity visible radiation to heat a single wafer for a short time at precisely controlled temperatures. These control capabilities, combined with the heating chamber's cold-wall design and thermal uniformity, provide significant advantages over conventional furnace processing. Applications include: Ion Implant activation, Polysilicon annealing, Oxide reflow, Silicide formation, Contact alloying, Oxidation and Nitridation and Compound semiconductor processing.