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The Initial Toolset ( Cleanroom Tool Reservation System )

 
Current Area Name Tool ID Equipment Description Manufacturer Model
Thin Films/Etch Item 11 Furnace (4 Tube) CVD Equipment 4 Stack
Thin Films/Etch Item 3 PECVD (Oxide, Nitride) Unaxis/Plasma Therm 790
Thin Films/Etch Item 4 E-Beam Evaporator Temescal BJD-1800
Thin Films/Etch Item 5 Thermal Evaporator Temescal BJD-1800
Thin Films/Etch Item 52 Rapid Thermal Annealer MPT Corp. RTP 600S
Thin Films/Etch Item 53 Deep Reactive Ion Etcher STS Multiplex RIE
Thin Films/Etch Item 8A Spin Rinser Dryer Semitool ST-880D
Thin Films/Etch Item 54 Oxford Plasmalab 100/180 Oxford Multiplex ICP
Thin Films/Etch Item 6 Metal Sputtering Temescal BJD-1800
Photo/Metrology Item 15 Mask Aligner Suss MicroTec MA 6
Photo/Metrology Item 15A Mask Aligner Quintel Q4000
Photo/Metrology Item 21 Optical Microscope Nikon Eclipse L150
Photo/Metrology Item 21A 3D Confocal Microscope Hyphenated Systems H-S150 OP
Photo/Metrology Item 58 Focused Ion Beam Mill Leo 1540XB
Photo/Metrology Item A2 C/V Stress (plotter) MDC O'halloran
Photo/Metrology Item A3 Thin film stress gauge Dektak Software pkg. with Dektak 8 
Photo/Metrology Item 23 Surface Profilometer Dektak Dektak 8
Lithography Item N/A Atomic Layer Deposition Cambridge Nanotech Savannah 100
Lithography Item 16 Resist Coat Spin Station Headway/SCE Fab to spec
Lithography Item 13 8' Wet Bench (acid) SCE Fab to spec
Lithography Item 7A 7' Wet bench (base) SCE Fab to spec
Lithography Item 7B 6' Solvent Bench SCE Fab to spec
Lithography N/A Chemical Processing Station CPK Polos 200 ACD
Photo/Metrology Item 24B Ellipsometer Uvisel FUV200
Photo/Metrology Item 1 Batch Plasma Etcher/Asher Matrix System One
Photo/Metrology Item 8B Spin Rinser Dryer Semitool ST-880D
Photo/Metrology Item 9 SEM/E Beam Lithography Leo 1550
Photo/Metrology 25B IV Probe station Signatone CM200
Photo/Metrology 70 Atomic Force Microscope Veeco Dimension 5000