Resist Coat Spin Station
The Photo-Resist Spin
Coat station (tool #16) is a custom designed tool that applies a layer
of photosensitive material (photoresist) to the substrates. The
substrates are placed on a vacuum chuck and droplets of photoresist
are placed in the center. The chuck is then spun at high speed with
centrifugal force and surface tension determining the thickness of the
resulting layer. The substrates are then placed on a hotplate to cure
the resist prior to the mask alignment step. Both Positive and
Negative chemistries are available.