The SEM/E-beam Lithography system (tool #9) is a Leo SUPRA 55 with electron-beam pattern generation capability. The combination of ultra-high resolution imaging, patterning and analytical capabilities gives the system exceptional versatility. This tool provides 12x to 900,000x magnification and is capable of producing patterns on components or photo-masks with resolutions from 4nm at 1kv to 1nm at 15kv.